Volume 8, No. 5, September 2019

General Information

  • ISSN: 2278-0149 (Online)
  • Abbreviated Title:  Int. J. Mech. Eng. Robot. Res.  
  • Editor-in-Chief: ​Prof Richard (Chunhui) Yang, Western Sydney University, Australia
  • Associate Editor: Prof. B.V. Appa Rao, Andhra University; Prof. Ian R. McAndrew, Capitol Technology University, USA
  • Managing Editor: Murali Krishna. B
  • DOI: 10.18178/ijmerr
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International Journal of Mechanical Engineering and Robotics Research
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The Mechanistic Process Analysis and Temperature Effect in a Low Pressure Square Type Atomic Layer Deposition Reactor

Rigardt Alfred Maarten Coetzee 1, Tien-Chien Jen 1, Muaaz Bhamjee 1, and Junling Lu 2
1. Department of Mechanical Engineering Science, University of Johannesburg, Johannesburg, Auckland Park, South Africa
2. Department of Chemical Physics, University of Science and Technology of China, Baohe District, Hefei, China

Abstract—This work studies the fundamental operation behaviour of the nano thin film manufacturing process called atomic layer deposition. This attractive key-enabling nanotechnology is well known to deposit ultrathin, uniform, conformal and pinhole-free nano-films on complex topography. It is used in microelectronics, solar cells, food packaging, fuel cells, and water purification systems, among other applications. However, the technology is facing an impasse in providing detailed information on the understanding of the ALD process. With numerical simulations, this study investigates the internal mechanical behaviour and the growth rates in the Al2O3 thin film ALD process influenced at temperatures of 200°C and 250°C. TMA and O3 precursors with argon gas as the purge substance are used to examine an arbitrary Gemstar 6 ALD reactor. The governing laws of the conservation of mass, momentum, energy, species, and kinetic chemical reactions are analysed in a continuum domain, by using the software ANSYS Fluent and ChemkinPro. The results were validated by available literature and good agreement was achieved.

Index Terms—advance manufacturing, nanotechnology, atomic layer deposition, ultra-thin film

Cite: Rigardt Alfred Maarten Coetzee, Tien-Chien Jen, Muaaz Bhamjee, and Junling Lu, "The Mechanistic Process Analysis and Temperature Effect in a Low Pressure Square Type Atomic Layer Deposition Reactor" International Journal of Mechanical Engineering and Robotics Research, Vol. 8, No. 5, pp. 792-796, September 2019. DOI: 10.18178/ijmerr.8.5.792-796